Anabela Veloso

Publication Activity (10 Years)

Years Active: 2007-2023
Publications (10 Years): 10

Top Topics

Successive Approximation

Metal Oxide Semiconductor

Rapid Development

Equivalent Circuit

Top Venues

VLSI Technology and Circuits

Publications

S. Yang, Pieter Schuddinck, Marie Garcia Bardon, Yang Xiang, Anabela Veloso, B. T. Chan, Gioele Mirabelli, Gaspard Hiblot, Geert Hellings, Julien Ryckaert
PPA and Scaling Potential of Backside Power Options in N2 and A14 Nanosheet Technology. VLSI Technology and Circuits (2023)
W.-C. Chen, S.-H. Chen, Anabela Veloso, Kateryna Serbulova, Geert Hellings, Guido Groeseneken
Upcoming Challenges of ESD Reliability in DTCO with BS-PDN Routing via BPRs. VLSI Technology and Circuits (2023)
Anabela Veloso, A. Jourdain, D. Radisic, R. Chen, G. Arutchelvan, B. O'Sullivan, Hiroaki Arimura, Michele Stucchi, An De Keersgieter, M. Hosseini, T. Hopf, K. D'Have, S. Wang, E. Dupuy, G. Mannaert, Kevin Vandersmissen, S. Iacovo, P. Marien, S. Choudhury, F. Schleicher, F. Sebaai, Y. Oniki, X. Zhou, A. Gupta, Tom Schram, B. Briggs, C. Lorant, E. Rosseel, Andriy Hikavyy, Roger Loo, J. Geypen, D. Batuk, G. T. Martinez, J. P. Soulie, Katia Devriendt, B. T. Chan, S. Demuynck, Gaspard Hiblot, Geert Van der Plas, Julien Ryckaert, Gerald Beyer, E. Dentoni Litta, Eric Beyne, Naoto Horiguchi
Scaled FinFETs Connected by Using Both Wafer Sides for Routing via Buried Power Rails. VLSI Technology and Circuits (2022)
Anabela Veloso, Geert Eneman, An De Keersgieter, P. Favia, Andriy Hikavyy, R. Chen, Anne Jourdain, N. Horiguchi
Innovations in Transistor Architecture and Device Connectivity for Advanced Logic Scaling. ICICDT (2022)
K. Serbulova, S.-H. Chen, Geert Hellings, Anabela Veloso, Anne Jourdain, Dimitri Linten, J. De Boeck, Guido Groeseneken, Julien Ryckaert, Gert Van der Plas, Eric Beyne, Eugenio Dentoni Litta, Naoto Horiguchi
Enabling Active Backside Technology for ESD and LU Reliability in DTCO/STCO. VLSI Technology and Circuits (2022)
Carlos H. S. Coelho, João Antonio Martino, Marcello Bellodi, Eddy Simoen, Anabela Veloso, Paula Ghedini Der Agopian
Analysis of zero-temperature coefficient behavior on vertically stacked double nanosheet nMOS devices. Microelectron. J. 117 (2021)
Trong Huynh Bao, Anabela Veloso, Sushil Sakhare, Philippe Matagne, Julien Ryckaert, Manu Perumkunnil, Davide Crotti, Farrukh Yasin, Alessio Spessot, Arnaud Furnémont, Gouri Sankar Kar, Anda Mocuta
Process, Circuit and System Co-optimization of Wafer Level Co-Integrated FinFET with Vertical Nanosheet Selector for STT-MRAM Applications. DAC (2019)
Eddy Simoen, Alberto Vinicius Oliveira, Anabela Veloso, Adrian Vaisman Chasin, Romain Ritzenthaler, Hans Mertens, Naoto Horiguchi, Cor Claeys
Impact of Device Architecture and Gate Stack Processing on the Low-Frequency Noise of Silicon Nanowire Transistors. ASICON (2019)
Bertrand Parvais, Geert Hellings, Marco Simicic, Pieter Weckx, Jérôme Mitard, Doyoung Jang, V. Deshpande, B. van Liempc, Anabela Veloso, A. Vandooren, Niamh Waldron, Piet Wambacq, Nadine Collaert, Diederik Verkest
Scaling CMOS beyond Si FinFET: an analog/RF perspective. ESSDERC (2018)
Nadine Collaert, AliReza Alian, H. Arimura, Geert Boccardi, Geert Eneman, Jacopo Franco, Tsvetan Ivanov, Dennis Lin, Jérôme Mitard, S. Ramesh, R. Rooyackers, Marc Schaekers, A. Sibaya-Hernandez, S. Sioncke, Quentin Smets, Abhitosh Vais, A. Vandooren, Anabela Veloso, Anne S. Verhulst, D. Verreck, Niamh Waldron, Amey Walke, Liesbeth Witters, H. Yu, X. Zhou, Aaron Voon-Yew Thean
Beyond-Si materials and devices for more Moore and more than Moore applications. ICICDT (2016)
Trong Huynh Bao, Dmitry Yakimets, Julien Ryckaert, Ivan Ciofi, Rogier Baert, Anabela Veloso, Jürgen Bömmels, Nadine Collaert, Philippe Roussel, S. Demuynck, Praveen Raghavan, Abdelkarim Mercha, Zsolt Tokei, Diederik Verkest, Aaron Thean, Piet Wambacq
Circuit and process co-design with vertical gate-all-around nanowire FET technology to extend CMOS scaling for 5nm and beyond technologies. ESSDERC (2014)
Eddy Simoen, Marc Aoulaiche, Anabela Veloso, M. Jurczak, Cor Claeys, L. Mendes Almeida, Maria Glória Caño de Andrade, A. Luque Rodriguez, J. A. Jimenez Tejada, Christian Caillat, Pierre Fazan
On the correlation between the retention time of FBRAM and the low-frequency noise of UTBOX SOI nMOSFETs. ESSDERC (2012)
A. Kerber, Luigi Pantisano, Anabela Veloso, Guido Groeseneken, Martin Kerber
Reliability screening of high-k dielectrics based on voltage ramp stress. Microelectron. Reliab. 47 (4-5) (2007)
A. Shickova, Ben Kaczer, Anabela Veloso, Marc Aoulaiche, M. Houssa, H. E. Maes, Guido Groeseneken, J. A. Kittl
NBTI reliability of Ni FUSI/HfSiON gates: Effect of silicide phase. Microelectron. Reliab. 47 (4-5) (2007)
A. Rothschild, R. Mitsuhashi, Christoph Kerner, X. Shi, J. L. Everaert, L. Date, Thierry Conard, Olivier Richard, C. Vrancken, R. Verbeeck, Anabela Veloso, A. Lauwers, M. de Potter de ten Broeck, I. Debusschere, M. Jurczak, M. Niwa, Philippe Absil, S. Biesemans
Ni-FUSI CMOS transistors. Microelectron. Reliab. 47 (4-5) (2007)