Kenichi Miyaguchi

Publication Activity (10 Years)

Years Active: 2013-2022
Publications (10 Years): 7

Top Topics

Shape Variability

Charge Coupled Device

Metal Oxide Semiconductor

Top Venues

Publications

R. Chen, Giuliano Sisto, Michele Stucchi, Anne Jourdain, Kenichi Miyaguchi, Pieter Schuddinck, P. Woeltgens, H. Lin, Naveen Kakarla, A. Veloso, Dragomir Milojevic, Odysseas Zografos, Pieter Weckx, Geert Hellings, Geert Van der Plas, Julien Ryckaert, Eric Beyne
Backside PDN and 2.5D MIMCAP to Double Boost 2D and 3D ICs IR-Drop beyond 2nm Node. VLSI Technology and Circuits (2022)
Kenichi Miyaguchi, Yoojin Ban, Nicolas Pantano, Xiao Sun, Philippe Absil, Lieve Bogaerts, Peter Verheyen, Dimitrios Velenis, Marianna Pantouvaki, Joris Van Campenhout
110GHz Through-Silicon Via's Integrated in Silicon Photonics Interposers for Next-Generation Optical Modules. ECOC (2021)
Alessio Spessot, Bertrand Parvais, Amita Rawat, Kenichi Miyaguchi, Pieter Weckx, Doyoung Jang, Julien Ryckaert
Device Scaling roadmap and its implications for Logic and Analog platform. BCICTS (2020)
F. M. Bufler, Kenichi Miyaguchi, Thomas Chiarella, N. Horiguchi, Anda Mocuta
On the ballistic ratio in 14nm-Node FinFETs. ESSDERC (2017)
Halil Kükner, Pieter Weckx, Sébastien Morrison, Jacopo Franco, Maria Toledano-Luque, Moonju Cho, Praveen Raghavan, Ben Kaczer, Doyoung Jang, Kenichi Miyaguchi, Marie Garcia Bardon, Francky Catthoor, Liesbet Van der Perre, Rudy Lauwereins, Guido Groeseneken
Comparison of NBTI aging on adder architectures and ring oscillators in the downscaling technology nodes. Microprocess. Microsystems 39 (8) (2015)
Kazuyuki Tomida, Keizo Hiraga, Morin Dehan, Geert Hellings, Doyoung Jang, Kenichi Miyaguchi, Thomas Chiarella, Minsoo Kim, Anda Mocuta, Naoto Horiguchi, Abdelkarim Mercha, Diederik Verkest, Aaron Thean
Impact of fin shape variability on device performance towards 10nm node. ICICDT (2015)
Kenichi Miyaguchi, Bertrand Parvais, Lars-Åke Ragnarsson, Piet Wambacq, Praveen Raghavan, Abdelkarim Mercha, Anda Mocuta, Diederik Verkest, Aaron Thean
Modeling FinFET metal gate stack resistance for 14nm node and beyond. ICICDT (2015)
Julien Ryckaert, Praveen Raghavan, Rogier Baert, Marie Garcia Bardon, M. Dusa, Arindam Mallik, Sushil Sakhare, B. Vandewalle, Piet Wambacq, Bharani Chava, Kris Croes, Morin Dehan, Doyoung Jang, P. Leray, T.-T. Liu, Kenichi Miyaguchi, Bertrand Parvais, P. Schuddinck, P. Weemaes, Abdelkarim Mercha, Jürgen Bömmels, N. Horiguchi, G. McIntyre, Aaron Thean, Zsolt Tokei, S. Cheng, Diederik Verkest, A. Steegen
Design Technology co-optimization for N10. CICC (2014)
Doyoung Jang, Marie Garcia Bardon, Dmitry Yakimets, Kenichi Miyaguchi, An De Keersgieter, Thomas Chiarella, Romain Ritzenthaler, Morin Dehan, Abdelkarim Mercha
STI and eSiGe source/drain epitaxy induced stress modeling in 28 nm technology with replacement gate (RMG) process. ESSDERC (2013)