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Impact of fin shape variability on device performance towards 10nm node.

Kazuyuki TomidaKeizo HiragaMorin DehanGeert HellingsDoyoung JangKenichi MiyaguchiThomas ChiarellaMinsoo KimAnda MocutaNaoto HoriguchiAbdelkarim MerchaDiederik VerkestAaron Thean
Published in: ICICDT (2015)
Keyphrases
  • shape variability
  • shape model
  • anatomical structures
  • shape variations
  • metal oxide semiconductor
  • image sequences
  • x ray
  • boundary conditions
  • silicon on insulator