Login / Signup

Modeling FinFET metal gate stack resistance for 14nm node and beyond.

Kenichi MiyaguchiBertrand ParvaisLars-Åke RagnarssonPiet WambacqPraveen RaghavanAbdelkarim MerchaAnda MocutaDiederik VerkestAaron Thean
Published in: ICICDT (2015)
Keyphrases
  • metal oxide
  • website
  • tree structure
  • image sequences
  • directed graph
  • real time
  • real world
  • machine learning
  • knowledge base
  • web services
  • case study
  • search algorithm
  • graph structure
  • modeling framework
  • leakage current