CHEMICAL VAPOR DEPOSITION
Experts
- María de la Luz Olvera-Amador
- George J. Papaioannou
- Shun'ichiro Ohmi
- Hagen Klauk
- Anna Zawadzka
- Arturo Maldonado
- C. A. Dimitriadis
- Panagiotis D. Christofides
- Yasuhiro Matsumoto
- Domenico Caputo
- Hei Wong
- Loukas Michalas
- Matroni Koutsoureli
- Ute Zschieschang
- Magali Estrada
- Giampiero de Cesare
- Benjamín Iñíguez
- Andrzej Korcala
- Andrey Kosarev
- Apostolos T. Voutsas
- Augusto Nascetti
- G. Kamarinos
- Fumihito Arai
- Gerassimos Orkoulas
- James C. Sturm
- Mutsumi Kimura
- Tokiyoshi Matsuda
- Przemyslaw Plóciennik
- Marc Christopher Wurz
- Martha A. Gallivan
- Naveen Verma
- Antonio Cerdeira
- Sigurd Wagner
- Ilgu Yun
- François Templier
- Dimitrios N. Kouvatsos
- Rico Ottermann
- K. Waszkowska
- Folke Dencker
Venues
- Sensors
- Microelectron. Reliab.
- Microelectron. J.
- NEMS
- IEICE Trans. Electron.
- CCE
- IEEE SENSORS
- IEEE Trans. Instrum. Meas.
- ICTON
- CoRR
- IEEE Access
- OFC
- EMBC
- IRPS
- IBM J. Res. Dev.
- ESSDERC
- Sci. China Inf. Sci.
- 3DIC
- IEICE Electron. Express
- IEEE J. Solid State Circuits
- DRC
- Symmetry
- Proc. IEEE
- ISCAS
- ACC
- Displays
- SIAM J. Appl. Math.
- IEEE Trans. Ind. Electron.
- Comput. Phys. Commun.
- Int. J. Autom. Technol.
- J. Sensors
- IET Circuits Devices Syst.
- ICICDT
- Entropy
- I2MTC
- ISSCC
- Comput. Chem. Eng.
- J. Inform. and Commun. Convergence Engineering
- IEEE Trans. Geosci. Remote. Sens.
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