CHEMICAL VAPOR DEPOSITION
Experts
- George J. Papaioannou
- María de la Luz Olvera-Amador
- Shun'ichiro Ohmi
- Arturo Maldonado
- Anna Zawadzka
- Panagiotis D. Christofides
- Hagen Klauk
- C. A. Dimitriadis
- Yasuhiro Matsumoto
- Loukas Michalas
- Domenico Caputo
- Hei Wong
- Ute Zschieschang
- Matroni Koutsoureli
- Augusto Nascetti
- Andrey Kosarev
- G. Kamarinos
- Andrzej Korcala
- Magali Estrada
- Apostolos T. Voutsas
- Benjamín Iñíguez
- Giampiero de Cesare
- Tokiyoshi Matsuda
- Martha A. Gallivan
- James C. Sturm
- Ilgu Yun
- Mutsumi Kimura
- Marc Christopher Wurz
- Fumihito Arai
- Antonio Cerdeira
- Gerassimos Orkoulas
- Przemyslaw Plóciennik
- Naveen Verma
- Sigurd Wagner
- Leonid Mochalov
- Dimitrios N. Kouvatsos
- Yulong Zhao
- Warren Rieutort-Louis
- Sutichai Chaisitsak
Venues
- Sensors
- Microelectron. Reliab.
- Microelectron. J.
- NEMS
- IEICE Trans. Electron.
- CCE
- IEEE SENSORS
- IEEE Trans. Instrum. Meas.
- ICTON
- CoRR
- IEEE Access
- EMBC
- OFC
- IBM J. Res. Dev.
- IRPS
- ESSDERC
- IEEE J. Solid State Circuits
- IEICE Electron. Express
- 3DIC
- DRC
- Symmetry
- Proc. IEEE
- Sci. China Inf. Sci.
- ACC
- IEEE Trans. Ind. Electron.
- Displays
- ISCAS
- SIAM J. Appl. Math.
- Int. J. Autom. Technol.
- J. Sensors
- Comput. Phys. Commun.
- IET Circuits Devices Syst.
- Entropy
- ICICDT
- IEEE Trans. Geosci. Remote. Sens.
- MHS
- ISSCC
- J. Inform. and Commun. Convergence Engineering
- Comput. Chem. Eng.
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