Hyun-Chul Sagong

Publication Activity (10 Years)

Years Active: 2015-2020
Publications (10 Years): 6

Top Topics

Processing Capabilities

Metal Oxide Semiconductor

Top Venues

Publications

Hai Jiang, Hyun-Chul Sagong, Jinju Kim, Hyewon Shim, Yoohwan Kim, Junekyun Park, Taiki Uemura, Yongsung Ji, Taeyoung Jeong, Dongkyun Kwon, Hwasung Rhee, Sangwoo Pae, Brandon Lee
Advanced Self-heating Model and Methodology for Layout Proximity Effect in FinFET Technology. IRPS (2020)
Hai Jiang, Hyun-Chul Sagong, Jinju Kim, Junekyun Park, Sangchul Shin, Sangwoo Pae
Localized Layout Effect Related Reliability Approach in 8nm FinFETs Technology: From Transistor to Circuit. IRPS (2019)
Taiki Uemura, Soonyoung Lee, Dahye Min, Ihlhwa Moon, Jungman Lim, Seungbae Lee, Hyun-Chul Sagong, Sangwoo Pae
Investigation of alpha-induced single event transient (SET) in 10 nm FinFET logic circuit. IRPS (2018)
Younggeun Ji, Jeonghoon Kim, Jungin Kim, Miji Lee, Jaeheon Noh, Taeyoung Jeong, Juhyeon Shin, Junho Kim, Young Heo, Ung Cho, Hyun-Chul Sagong, Junekyun Park, Yeonsik Choo, Gilhwan Do, Hoyoung Kang, Eunkyeong Choi, Dongyoon Sun, Changki Kang, Sangchul Shin, Sangwoo Pae
Reliability characterization of advanced CMOS image sensor (CIS) with 3D stack and in-pixel DTI. IRPS (2018)
Hyunjin Kim, Minjung Jin, Hyun-Chul Sagong, Jinju Kim, Ukjin Jung, Minhyuck Choi, Junekyun Park, Sangchul Shin, Sangwoo Pae
A systematic study of gate dielectric TDDB in FinFET technology. IRPS (2018)
Hyun-Chul Sagong, Hyunjin Kim, Seungjin Choo, Sungyoung Yoon, Hyewon Shim, Sangsu Ha, Tae-Young Jeong, Minhyeok Choe, Junekyun Park, Sangchul Shin, Sangwoo Pae
Effects of Far-BEOL anneal on the WLR and product reliability characterization of FinFET process technology. IRPS (2018)
Changze Liu, Hyun-Chul Sagong, Hyejin Kim, Seungjin Choo, Hyunwoo Lee, Yoohwan Kim, Hyunjin Kim, Bisung Jo, Minjung Jin, Jinjoo Kim, Sangsu Ha, Sangwoo Pae, Jongwoo Park
Systematical study of 14nm FinFET reliability: From device level stress to product HTOL. IRPS (2015)