Advanced Self-heating Model and Methodology for Layout Proximity Effect in FinFET Technology.
Hai JiangHyun-Chul SagongJinju KimHyewon ShimYoohwan KimJunekyun ParkTaiki UemuraYongsung JiTaeyoung JeongDongkyun KwonHwasung RheeSangwoo PaeBrandon LeePublished in: IRPS (2020)