Cheolgyu Kim

Publication Activity (10 Years)

Years Active: 2012-2021
Publications (10 Years): 3

Top Topics

Significantly Enhanced

Chemical Vapor Deposition

Field Effect Transistors

Top Venues

Microelectron. Reliab.

Publications

Yusen Zhao, Chiao-Yueh Lo, Lecheng Ruan, Chen-Huan Pi, Cheolgyu Kim, Yousif Alsaid, Imri Frenkel, Rossana Rico, Tsu-Chin Tsao, Ximin He
Somatosensory actuator based on stretchable conductive photothermally responsive hydrogel. Sci. Robotics 6 (53) (2021)
Cheolgyu Kim, Tae-Ik Lee, Min Sung Kim, Taek-Soo Kim
Mechanism of warpage orientation rotation due to viscoelastic polymer substrates during thermal processing. Microelectron. Reliab. 73 (2017)
Giyoun Roh, Hyeokjin Kim, Cheolgyu Kim, Dongwoo Kim, Bongkoo Kang
dielectric n-MOSFETs under positive bias temperature instability. Microelectron. Reliab. 72 (2017)
Cheolgyu Kim, Hyeokjin Kim, Bongkoo Kang
nMOSFETs under positive bias temperature instability. Microelectron. Reliab. 54 (11) (2014)
Seonhaeng Lee, Cheolgyu Kim, Hyeokjin Kim, Gang-Jun Kim, Ji-Hoon Seo, Donghee Son, Bongkoo Kang
Effect of negative bias temperature instability induced by a low stress voltage on nanoscale high-k/metal gate pMOSFETs. Microelectron. Reliab. 53 (9-11) (2013)
Seonhaeng Lee, Dongwoo Kim, Cheolgyu Kim, Chiho Lee, Jeongsoo Park, Bongkoo Kang
Channel width dependence of mechanical stress effects induced by shallow trench isolation on device performance of nanoscale nMOSFETs. Microelectron. Reliab. 52 (9-10) (2012)
Seonhaeng Lee, Dongwoo Kim, Cheolgyu Kim, N.-H. Lee, Gang-Jun Kim, Chiho Lee, Jeongsoo Park, Bongkoo Kang
Effect of electron-electron scattering at an elevated temperature on device lifetime of nanoscale nMOSFETs. Microelectron. Reliab. 52 (9-10) (2012)
Dongwoo Kim, Seonhaeng Lee, Cheolgyu Kim, Chiho Lee, Jeongsoo Park, Bongkoo Kang
Enhanced degradation of n-MOSFETs with high-k/metal gate stacks under channel hot-carrier/gate-induced drain leakage alternating stress. Microelectron. Reliab. 52 (9-10) (2012)