Paul K. Hurley

Publication Activity (10 Years)

Years Active: 2001-2017
Publications (10 Years): 2

Top Topics

Direct Manipulation

Graphical Interface

Development Environment

Top Venues

Microelectron. Reliab.

Publications

Gioele Mirabelli, Farzan Gity, Scott Monaghan, Paul K. Hurley, Ray Duffy
Impact of impurities, interface traps and contacts on MoS2 MOSFETs: Modelling and experiments. ESSDERC (2017)
Patrick Ponath, Agham B. Posadas, Yuan Ren, Xiaoyu Wu, Keji Lai, Alex Demkov, Michael Schmidt, Ray Duffy, Paul K. Hurley, Jian Wang, Chadwin D. Young, Rama K. Vasudevan, M. Baris Okatan, Stephen Jesse, Sergei V. Kalinin
Advances of the development of a ferroelectric field-effect transistor on Ge(001). ICICDT (2017)
X. Saura, D. Moix, Jordi Suñé, Paul K. Hurley, Enrique Miranda
Direct observation of the generation of breakdown spots in MIM structures under constant voltage stress. Microelectron. Reliab. 53 (9-11) (2013)
Enrique Miranda, Eamon O'Connor, Paul K. Hurley
Exploratory analysis of the breakdown spots spatial distribution in metal gate/high-K/III-V stacks using functional summary statistics. Microelectron. Reliab. 50 (9-11) (2010)
Enrique Miranda, Javier Martín-Martínez, Eamon O'Connor, G. Hughes, P. Casey, Karim Cherkaoui, S. Monaghan, R. Long, D. O'Connell, Paul K. Hurley
Effects of the electrical stress on the conduction characteristics of metal gate/MgO/InP stacks. Microelectron. Reliab. 49 (9-11) (2009)
Paul K. Hurley, Karim Cherkaoui, S. McDonnell, G. Hughes, A. W. Groenland
/TiN gate stacks. Microelectron. Reliab. 47 (8) (2007)
Octavian Buiu, Steve Hall, Olof Engström, B. Raeissi, Max C. Lemme, Paul K. Hurley, Karim Cherkaoui
Extracting the relative dielectric constant for "high-kappa layers" from CV measurements - Errors and error propagation. Microelectron. Reliab. 47 (4-5) (2007)
Richard A. Farrell, Karim Cherkaoui, Nikolay Petkov, Heinz Amenitsch, Justin D. Holmes, Paul K. Hurley, Michael A. Morris
Physical and electrical properties of low dielectric constant self-assembled mesoporous silica thin films. Microelectron. Reliab. 47 (4-5) (2007)
Paul K. Hurley
Editorial. Microelectron. Reliab. 45 (5-6) (2005)
Q. Fang, I. Liaw, Mircea Modreanu, Paul K. Hurley, I. W. Boyd
thin films. Microelectron. Reliab. 45 (5-6) (2005)
J. M. Decams, H. Guillon, Carmen Jiménez, M. Audier, J. P. Sénateur, C. Dubourdieu, O. Cadix, Barry J. O'Sullivan, Mircea Modreanu, Paul K. Hurley
films obtained by UV assisted injection MOCVD. Microelectron. Reliab. 45 (5-6) (2005)
Y. Lu, Octavian Buiu, Steve Hall, Paul K. Hurley
Optical and electrical characterization of hafnium oxide deposited by MOCVD. Microelectron. Reliab. 45 (5-6) (2005)
Barry J. O'Sullivan, Paul K. Hurley, F. N. Cubaynes, P. A. Stolk, F. P. Widdershoven
Flat band voltage shift and oxide properties after rapid thermal annealing. Microelectron. Reliab. 41 (7) (2001)