Login / Signup

Physical and electrical properties of low dielectric constant self-assembled mesoporous silica thin films.

Richard A. FarrellKarim CherkaouiNikolay PetkovHeinz AmenitschJustin D. HolmesPaul K. HurleyMichael A. Morris
Published in: Microelectron. Reliab. (2007)
Keyphrases
  • electrical properties
  • thin film
  • film thickness
  • silicon nitride
  • dielectric constant
  • simulation software
  • multi layer
  • high density
  • short circuit
  • grain size
  • neural network
  • room temperature
  • image data
  • silicon dioxide