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Optical and electrical characterization of hafnium oxide deposited by MOCVD.

Y. LuOctavian BuiuSteve HallPaul K. Hurley
Published in: Microelectron. Reliab. (2005)
Keyphrases
  • electrical properties
  • silicon nitride
  • physical characteristics
  • leakage current
  • electron microscopy
  • electron beam
  • expert systems
  • optical imaging
  • neural network