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Flat band voltage shift and oxide properties after rapid thermal annealing.
Barry J. O'Sullivan
Paul K. Hurley
F. N. Cubaynes
P. A. Stolk
F. P. Widdershoven
Published in:
Microelectron. Reliab. (2001)
Keyphrases
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room temperature
electrical properties
infrared
desirable properties
metal oxide
low cost
electrical power
thermal conductivity
simulated annealing
high frequency
power supply