ELECTRON BEAM LITHOGRAPHY
Experts
- David Z. Pan
- Bei Yu
- Yao-Wen Chang
- Jhih-Rong Gao
- Shao-Yun Fang
- Kun Yuan
- Andrew J. Fleming
- Omid T. Ghalehbeygi
- Fumihito Arai
- Ulrich Rüde
- Roderick R. Kunz
- Soo-Young Lee
- Jungkwun J. K. Kim
- Carolin Körner
- Wengang Wu
- Toly Chen
- Matthias Markl
- Regina Ammer
- Xinghua Sang
- Laurent Maingault
- David H. Wojtas
- Kenta Nakamura
- Cor Meenderinck
- Noppachai Anupongpaibool
- John Mohammed
- Mihir Parikh
- Robert C. Frye
- Kevin D. Cummings
- Zhimin Zhang
- Yusuke Matsunaga
- Romain D. Arnal
- Hans C. Pfeiffer
- V. Havranek
- Haoyu Zhang
- Tomokazu Takahashi
- Ben S. Routley
- Timo Schwarz
- Dameli Assalauova
- Jian Kuang
Venues
- IBM J. Res. Dev.
- NEMS
- CoRR
- Sensors
- IEEE Trans. Comput. Aided Des. Integr. Circuits Syst.
- Microelectron. J.
- Microelectron. Reliab.
- IEICE Trans. Electron.
- OFC
- Micromachines
- Int. J. Autom. Technol.
- ICTON
- ICIP
- Comput. Phys. Commun.
- DAC
- ISSCC
- IEEE Access
- Proc. IEEE
- ISPD
- ISCAS
- ICCAD
- CICC
- ASP-DAC
- IEEE Trans. Instrum. Meas.
- ACC
- ICECS
- VLSI Design
- Int. J. Comput. Assist. Radiol. Surg.
- ICAC
- ISQED
- Int. J. Comput. Eng. Sci.
- IGARSS
- IEEE Trans. Ind. Electron.
- BCICTS
- ISBI
- IVCNZ
- BMEI
- IEEE Signal Process. Lett.
- IEEE Trans. Medical Imaging
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