Roderick R. Kunz

Publication Activity (10 Years)

Years Active: 1997-2001
Publications (10 Years): 0

Publications

A. Keith Bates, Mordechai Rothschild, Theodore M. Bloomstein, Theodore H. Fedynyshyn, Roderick R. Kunz, Vladimir Liberman, Michael Switkes
Review of technology for 157-nm lithography. IBM J. Res. Dev. 45 (5) (2001)
Robert D. Allen, Gregory M. Wallraff, Donald C. Hofer, Roderick R. Kunz
Photoresists for 193-nm lithography. IBM J. Res. Dev. 41 (1&2) (1997)
Mordechai Rothschild, Anthony R. Forte, Roderick R. Kunz, Susan C. Palmateer, Janusz H. C. Sedlacek
Lithography at a wavelength of 193 nm. IBM J. Res. Dev. 41 (1&2) (1997)
David E. Seeger, Douglas C. La Tulipe Jr., Roderick R. Kunz, Cesar M. Garza, Maureen A. Hanratty
Thin-film imaging: Past, present, prognosis. IBM J. Res. Dev. 41 (1&2) (1997)