Photoresists for 193-nm lithography.

Robert D. Allen Gregory M. Wallraff Donald C. Hofer Roderick R. Kunz

Published in: IBM J. Res. Dev. (1997)

Keyphrases

electron beam lithography
electron beam
x ray
data sets
artificial intelligence
genetic algorithm
computer vision
information systems
image processing
case study
learning environment
control system
probability distribution
silicon on insulator