Gregory M. Wallraff

Publication Activity (10 Years)

Years Active: 1997-2001
Publications (10 Years): 0

Publications

William D. Hinsberg, Frances A. Houle, Martha I. Sanchez, Gregory M. Wallraff
Chemical and physical aspects of the post-exposure baking process used for positive-tone chemically amplified resists. IBM J. Res. Dev. 45 (5) (2001)
Robert D. Allen, Gregory M. Wallraff, Donald C. Hofer, Roderick R. Kunz
Photoresists for 193-nm lithography. IBM J. Res. Dev. 41 (1&2) (1997)