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Chemical and physical aspects of the post-exposure baking process used for positive-tone chemically amplified resists.
William D. Hinsberg
Frances A. Houle
Martha I. Sanchez
Gregory M. Wallraff
Published in:
IBM J. Res. Dev. (2001)
Keyphrases
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data sets
e learning
computer vision
positive and negative
machine learning
learning algorithm
decision making
metadata
image processing
virtual environment
electron beam