Lithography at a wavelength of 193 nm.

Mordechai Rothschild Anthony R. Forte Roderick R. Kunz Susan C. Palmateer Janusz H. C. Sedlacek

Published in: IBM J. Res. Dev. (1997)

Keyphrases

electron beam lithography
electron beam
x ray
infrared
antenna array
transmission electron microscopy
data mining
search algorithm
neural network
website
end to end
integrated circuit
optical burst switching