Lars Liebmann

Publication Activity (10 Years)

Years Active: 2001-2015
Publications (10 Years): 0

Top Topics

Optimization Strategies

Enabling Technology

Electron Beam Lithography

Comprehensive Reference

Top Venues

ACM Great Lakes Symposium on VLSI

Publications

David Z. Pan, Lars Liebmann, Bei Yu, Xiaoqing Xu, Yibo Lin
Pushing multiple patterning in sub-10nm: are we ready? DAC (2015)
Wei Ye, Bei Yu, David Z. Pan, Yongchan Ban, Lars Liebmann
Standard Cell Layout Regularity and Pin Access Optimization Considering Middle-of-Line. ACM Great Lakes Symposium on VLSI (2015)
Kaushik Vaidyanathan, Lars Liebmann, Andrzej J. Strojwas, Larry T. Pileggi
Sub-20 nm design technology co-optimization for standard cell logic. ICCAD (2014)
Rani S. Ghaida, Kanak B. Agarwal, Sani R. Nassif, Xin Yuan, Lars Liebmann, Puneet Gupta
Layout Decomposition and Legalization for Double-Patterning Technology. IEEE Trans. Comput. Aided Des. Integr. Circuits Syst. 32 (2) (2013)
Lars Liebmann, J. Andres Torres
A Designer's Guide to Subresolution Lithography: Enabling the Impossible to Get to the 14-nm Node [Tutorial]. IEEE Des. Test 30 (3) (2013)
Shayak Banerjee, Kanak B. Agarwal, Sani R. Nassif, James A. Culp, Lars Liebmann, Michael Orshansky
Coupling timing objectives with optical proximity correction for improved timing yield. ISQED (2011)
Rani S. Ghaida, Kanak B. Agarwal, Sani R. Nassif, Xin Yuan, Lars Liebmann, Puneet Gupta
A framework for double patterning-enabled design. ICCAD (2011)
Tejas Jhaveri, Vyacheslav Rovner, Lars Liebmann, Larry T. Pileggi, Andrzej J. Strojwas, Jason Hibbeler
Co-Optimization of Circuits, Layout and Lithography for Predictive Technology Scaling Beyond Gratings. IEEE Trans. Comput. Aided Des. Integr. Circuits Syst. 29 (4) (2010)
Shayak Banerjee, Praveen Elakkumanan, Lars Liebmann, Michael Orshansky
Electrically driven optical proximity correction based on linear programming. ICCAD (2008)
Louis Scheffer, Lars Liebmann, Riko Rakojcic, David White
Rules vs tools: what's the right way to address IC manufacturing complexity? ISPD (2007)
Lars Liebmann
Layout impact of resolution enhancement techniques: impediment or opportunity? ISPD (2003)
Mark A. Lavin, Lars Liebmann
CAD computation for manufacturability: can we save VLSI technology from itself? ICCAD (2002)
Lars Liebmann, Scott M. Mansfield, Alfred K. Wong, Mark A. Lavin, William C. Leipold, Timothy G. Dunham
TCAD development for lithography resolution enhancement. IBM J. Res. Dev. 45 (5) (2001)
Fook-Luen Heng, Lars Liebmann, Jennifer Lund
Application of automated design migration to alternating phase shift mask design. ISPD (2001)
Lars Liebmann, Jennifer Lund, Fook-Luen Heng, Ioana Graur
Enabling Alternating Phase Shifted Mask Designs for a Full Logic Gate Level: Design Rules and Design Rule Checking. DAC (2001)