Yongchan Ban

Publication Activity (10 Years)

Years Active: 2008-2015
Publications (10 Years): 1

Top Topics

Optimization Strategies

Top Venues

ACM Great Lakes Symposium on VLSI

Publications

Wei Ye, Bei Yu, David Z. Pan, Yongchan Ban, Lars Liebmann
Standard Cell Layout Regularity and Pin Access Optimization Considering Middle-of-Line. ACM Great Lakes Symposium on VLSI (2015)
Bei Yu, Jhih-Rong Gao, Duo Ding, Yongchan Ban, Jae-Seok Yang, Kun Yuan, Minsik Cho, David Z. Pan
Dealing with IC manufacturability in extreme scaling (Embedded tutorial paper). ICCAD (2012)
Yongchan Ban, Kevin Lucas, David Z. Pan
Flexible 2D layout decomposition framework for spacer-type double pattering lithography. DAC (2011)
Yen-Hung Lin, Yongchan Ban, David Z. Pan, Yih-Lang Li
Doppler: DPL-aware and OPC-friendly gridless detailed routing with mask density balancing. ICCAD (2011)
Yongchan Ban, Jae-Seok Yang
Layout aware line-edge roughness modeling and poly optimization for leakage minimization. DAC (2011)
Yongchan Ban, David Z. Pan
Modeling of Layout Aware Line-Edge Roughness and Poly Optimization for Leakage Minimization. IEEE J. Emerg. Sel. Topics Circuits Syst. 1 (2) (2011)
Yongchan Ban, Savithri Sundareswaran, David Z. Pan
Total sensitivity based dfm optimization of standard library cells. ISPD (2010)
Yongchan Ban, David Z. Pan
Compact modeling and robust layout optimization for contacts in deep sub-wavelength lithography. DAC (2010)
Minsik Cho, Kun Yuan, Yongchan Ban, David Z. Pan
ELIAD: Efficient Lithography Aware Detailed Routing Algorithm With Compact and Macro Post-OPC Printability Prediction. IEEE Trans. Comput. Aided Des. Integr. Circuits Syst. 28 (7) (2009)
Minsik Cho, Kun Yuan, Yongchan Ban, David Z. Pan
ELIAD: efficient lithography aware detailed router with compact post-OPC printability prediction. DAC (2008)
Minsik Cho, Yongchan Ban, David Z. Pan
Double patterning technology friendly detailed routing. ICCAD (2008)