Optical properties of fluorinated silicon oxide films by liquid phase deposition for optical waveguides.
Tetsuya HommaAtsushi SatohSeiji OkadaMasahiro ItohMasaki YamaguchiHideo TakahashiPublished in: IEEE Trans. Instrum. Meas. (1998)
Keyphrases
- optical properties
- silicon nitride
- electrical properties
- thin film
- silicon dioxide
- waveguide
- chemical vapor deposition
- gate dielectrics
- plasma etching
- linear relationship
- wide field of view
- leakage current
- high density
- gate insulator
- film thickness
- transmission electron microscopy
- si sio
- multispectral images
- high temperature
- image acquisition
- electro optic