PLASMA ETCHING
Experts
- C. A. Dimitriadis
- Panagiotis D. Christofides
- K. Waszkowska
- B. Sahraoui
- María de la Luz Olvera-Amador
- Li Wen
- G. Kamarinos
- Domenico Caputo
- Toly Chen
- Yasuhiro Matsumoto
- Hai Wang
- Augusto Nascetti
- Apostolos T. Voutsas
- Pedro Barquinha
- Ilgu Yun
- Giampiero de Cesare
- Anna Zawadzka
- Jiaru Chu
- Mile Ivanda
- Ute Zschieschang
- Dimitrios N. Kouvatsos
- Paul S. Andry
- Mutsumi Kimura
- Qiuping Zhang
- Laurent Vivien
- Yi Wang
- Leonid Mochalov
- N. A. Hastas
- Kuniaki Tanaka
- Bian Tian
- François Templier
- In Man Kang
- Dedong Han
- Lei Sun
- Cornelia K. Tsang
- Gerassimos Orkoulas
- Arturo Maldonado
- Hiroaki Usui
- Shun'ichiro Ohmi
Venues
- Sensors
- Microelectron. Reliab.
- Microelectron. J.
- NEMS
- IEICE Trans. Electron.
- OFC
- ICTON
- CoRR
- IEEE SENSORS
- CCE
- IEEE Access
- Proc. IEEE
- IBM J. Res. Dev.
- IEEE Trans. Instrum. Meas.
- Symmetry
- EMBC
- 3DIC
- IEICE Electron. Express
- ISCAS
- DRC
- SIAM J. Math. Anal.
- IEEE J. Solid State Circuits
- Sci. China Inf. Sci.
- ECOC
- ESSDERC
- J. Comput. Phys.
- Int. J. Comput. Eng. Sci.
- ICICDT
- Comput. Phys. Commun.
- Displays
- Int. J. Autom. Technol.
- ACC
- J. Sensors
- ISSCC
- IET Circuits Devices Syst.
- J. Inform. and Commun. Convergence Engineering
- Entropy
- CICC
- DAC
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