PLASMA ETCHING
Experts
- C. A. Dimitriadis
- Panagiotis D. Christofides
- K. Waszkowska
- María de la Luz Olvera-Amador
- B. Sahraoui
- Domenico Caputo
- G. Kamarinos
- Li Wen
- Yasuhiro Matsumoto
- Toly Chen
- Pedro Barquinha
- Anna Zawadzka
- Giampiero de Cesare
- Hai Wang
- Apostolos T. Voutsas
- Augusto Nascetti
- Ilgu Yun
- Laurent Vivien
- Hiroaki Usui
- Leonid Mochalov
- Mutsumi Kimura
- Zhuangde Jiang
- Hagen Klauk
- Gerassimos Orkoulas
- François Templier
- Dimitrios N. Kouvatsos
- Shun'ichiro Ohmi
- Paul S. Andry
- Yi Wang
- Bian Tian
- Joseph Jean Boutros
- Tokiyoshi Matsuda
- In Man Kang
- Jiaru Chu
- Mauricio Ortega-López
- Kuniaki Tanaka
- Arturo Maldonado
- Qiuping Zhang
- Dedong Han
Venues
- Sensors
- Microelectron. Reliab.
- Microelectron. J.
- NEMS
- IEICE Trans. Electron.
- OFC
- ICTON
- CoRR
- IEEE SENSORS
- CCE
- IEEE Access
- Proc. IEEE
- IBM J. Res. Dev.
- IEEE Trans. Instrum. Meas.
- Symmetry
- 3DIC
- EMBC
- DRC
- IEICE Electron. Express
- ISCAS
- IEEE J. Solid State Circuits
- Sci. China Inf. Sci.
- SIAM J. Math. Anal.
- ECOC
- J. Comput. Phys.
- ESSDERC
- Int. J. Comput. Eng. Sci.
- Comput. Phys. Commun.
- ICICDT
- Displays
- ACC
- J. Sensors
- Int. J. Autom. Technol.
- IET Circuits Devices Syst.
- ISSCC
- SIAM J. Appl. Math.
- CICC
- Entropy
- IRPS
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