PLASMA ETCHING
Experts
- Panagiotis D. Christofides
- C. A. Dimitriadis
- María de la Luz Olvera-Amador
- B. Sahraoui
- K. Waszkowska
- Toly Chen
- Yasuhiro Matsumoto
- Li Wen
- Domenico Caputo
- G. Kamarinos
- Hai Wang
- Apostolos T. Voutsas
- Ilgu Yun
- Giampiero de Cesare
- Augusto Nascetti
- Pedro Barquinha
- Anna Zawadzka
- Yi Wang
- Lei Sun
- François Templier
- Dimitrios N. Kouvatsos
- Cornelia K. Tsang
- Dedong Han
- N. A. Hastas
- Mile Ivanda
- Tokiyoshi Matsuda
- Joseph Jean Boutros
- In Man Kang
- Kuniaki Tanaka
- Leonid Mochalov
- Jiaru Chu
- Arturo Maldonado
- Mauricio Ortega-López
- Hagen Klauk
- Mutsumi Kimura
- Zhuangde Jiang
- Shun'ichiro Ohmi
- Hiroaki Usui
- Qiuping Zhang
Venues
- Sensors
- Microelectron. Reliab.
- Microelectron. J.
- NEMS
- IEICE Trans. Electron.
- OFC
- ICTON
- IEEE SENSORS
- CoRR
- CCE
- IEEE Access
- Proc. IEEE
- IBM J. Res. Dev.
- IEEE Trans. Instrum. Meas.
- Symmetry
- EMBC
- 3DIC
- IEICE Electron. Express
- ISCAS
- DRC
- SIAM J. Math. Anal.
- IEEE J. Solid State Circuits
- Sci. China Inf. Sci.
- ECOC
- ESSDERC
- J. Comput. Phys.
- Comput. Phys. Commun.
- ICICDT
- Int. J. Comput. Eng. Sci.
- Int. J. Autom. Technol.
- ACC
- Displays
- J. Sensors
- ISSCC
- IET Circuits Devices Syst.
- J. Inform. and Commun. Convergence Engineering
- CICC
- DAC
- MIPRO
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