NBTI in Si0.55Ge0.45 cladding p-FinFETs: Porting the superior reliability from planar to 3D architectures.
Jacopo FrancoBen KaczerPhilippe J. RousselErik BuryHans MertensRomain RitzenthalerTibor GrasserNaoto HoriguchiAaron TheanGuido GroesenekenPublished in: IRPS (2015)