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Correlation of Dielectric Breakdown and Nanoscale Adhesion in Silicon Dioxide Thin Films.
Alok Ranjan
Sean J. O'Shea
Michel Bosman
J. Molina
Nagarajan Raghavan
Kin Leong Pey
Published in:
IRPS (2020)
Keyphrases
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silicon nitride
silicon dioxide
thin film
leakage current
electrical properties
high temperature
chemical vapor deposition
high density
correlation coefficient
space charge
short circuit
atomic force microscopy
genetic algorithm
data streams
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