Fabrication of Submicron Beams with Galvanic Etch Stop for Si in TMAH.
Rong LuYanhong WuHaitao ChengHeng YangXinxin LiYuelin WangPublished in: Sensors (2009)
Keyphrases
- electron beam
- integrated circuit
- x ray
- metal oxide
- semiconductor devices
- manufacturing process
- design parameters
- plasma etching
- vlsi circuits
- reinforced concrete
- high density
- database replication
- electron beam lithography
- high speed
- si sio
- database
- leakage current
- smoking cessation
- chemical vapor deposition
- electrical properties
- low power
- multi agent
- knowledge base