Low temperature through-Si via fabrication using electroless deposition.
Fumihiro InoueHarold PhilipsenAlex RadisicSilvia ArminiPeter LeunissenHiroshi MiyakeRyohei ArimaTomohiro ShimizuToshiaki ItoHirofumi SekiYuko ShinozakiTomohiko YamamotoShoso ShingubaraPublished in: 3DIC (2011)