Improved Photoluminescence Intensity of Silicon Rich Oxide Film by Surface Etching.
J. Juan Avilés BravoAlfredo Morales-SánchezLiliana Palacios-HuertaJ. Federico Ramirez RiosMario MorenoPublished in: CCE (2023)
Keyphrases
- si sio
- silicon dioxide
- thin film
- magnetic recording
- film thickness
- silicon nitride
- metal oxide
- leakage current
- plasma etching
- high density
- high speed
- surface reconstruction
- transmission electron microscopy
- shape index
- high level
- surface geometry
- intensity images
- field effect transistors
- high temperature
- visual effects
- space charge
- electron microscopy
- intensity variations
- image intensity
- medical images
- d objects
- gallium arsenide
- real world