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On the impact of mechanical stress on gate oxide trapping.

Anastasiia KruvBen KaczerAlexander GrillMario GonzalezJacopo FrancoDimitri LintenWolfgang GösTibor GrasserIngrid De Wolf
Published in: IRPS (2020)
Keyphrases
  • silicon dioxide
  • factors that influence
  • case study
  • electron microscopy
  • leakage current
  • computer vision
  • information technology