Silicon CMOS compatible in situ CCVD growth of graphene on silicon nitride.
Dennis NollUdo SchwalkePublished in: DTIS (2015)
Keyphrases
- gate dielectrics
- electrical properties
- silicon dioxide
- high speed
- thin film
- low cost
- cmos technology
- high density
- metal oxide semiconductor
- silicon nitride
- silicon on insulator
- plasma etching
- power supply
- si sio
- low power
- power consumption
- high temperature
- vlsi circuits
- chemical vapor deposition
- circuit design
- low voltage
- real time
- neural network
- delay insensitive
- image sensor
- hardware and software
- gallium arsenide