Conduction mechanisms in MOS gate dielectric films.
Bing-Liang YangP. T. LaiHei WongPublished in: Microelectron. Reliab. (2004)
Keyphrases
- electrical properties
- silicon dioxide
- gate dielectrics
- silicon nitride
- space charge
- leakage current
- field effect transistors
- chemical vapor deposition
- high density
- steady state
- mathematical analysis
- electric field
- film thickness
- schottky barrier
- databases
- thin film
- mechanisms underlying
- real time
- high temperature
- markov chain
- search algorithm
- image processing