APPEARANCE MODEL
Experts
- Ming-Hsuan Yang
- Huchuan Lu
- Petar M. Djuric
- Weiming Hu
- Dong Wang
- Haibin Ling
- Zhenyu He
- Changhong Fu
- Luc Van Gool
- Lyudmila Mihaylova
- Jiri Matas
- Chenglong Li
- Timothy F. Cootes
- Larry S. Davis
- Christopher J. Taylor
- Mónica F. Bugallo
- Simon J. Godsill
- Hanzi Wang
- Rama Chellappa
- Hongxun Yao
- Jie Yang
- Jin Tang
- Jenq-Neng Hwang
- Horst Bischof
- Andrea Cavallaro
- Fredrik Gustafsson
- Shengping Zhang
- Martin Danelljan
- Jinqiao Wang
- Nassir Navab
- Marcus Baum
- Heng Fan
- Philip H. S. Torr
- Junseok Kwon
- Michael Felsberg
- Allen R. Tannenbaum
- Uwe D. Hanebeck
- Maja Pantic
- Marcelo G. S. Bruno
Venues
- CoRR
- IEEE Access
- FUSION
- CVPR
- ICIP
- Sensors
- ICASSP
- ICRA
- IROS
- ICPR
- ICCV
- Neurocomputing
- IEEE Trans. Circuits Syst. Video Technol.
- BMVC
- Multim. Tools Appl.
- IEEE Trans. Image Process.
- CDC
- ACC
- EUSIPCO
- Pattern Recognit.
- IEEE Trans. Signal Process.
- AVSS
- CVPR Workshops
- IEEE Trans. Pattern Anal. Mach. Intell.
- Image Vis. Comput.
- ICME
- IEEE Trans. Aerosp. Electron. Syst.
- IEEE Trans. Instrum. Meas.
- Comput. Vis. Image Underst.
- Remote. Sens.
- WACV
- EMBC
- ROBIO
- Mach. Vis. Appl.
- IEEE Signal Process. Lett.
- Signal Process.
- Int. J. Comput. Vis.
- SMC
- Pattern Recognit. Lett.
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