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Role of Defects in the Reliability of HfO2/Si-Based Spacer Dielectric Stacks for Local Interconnects.
Chen Wu
Adrian Chasin
Andrea Padovani
Alicja Lesniewska
Steven Demuynck
Kris Croes
Published in:
IRPS (2019)
Keyphrases
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chemical vapor deposition
transmission line
leakage current
thin film
gate dielectrics
electrical properties
database systems
expert systems
real time
genetic algorithm
information systems
input output
differential equations
defect detection
reliability analysis
automated visual inspection