Wen-Kuan Yeh

Publication Activity (10 Years)

Years Active: 2007-2020
Publications (10 Years): 3

Top Topics

Silicon On Insulator

Top Venues

Microelectron. Reliab.

IEICE Trans. Electron.

Publications

Wen Yang, Jiann-Shiun Yuan, Balakrishnan Krishnan, An-Jye Tzou, Wen-Kuan Yeh
Substrate Bias Effect on Dynamic Characteristics of a Monolithically Integrated GaN Half-Bridge. IRPS (2020)
Wen-Teng Chang, Shih-Wei Lin, Min-Cheng Chen, Wen-Kuan Yeh
Relationship of Channel and Surface Orientation to Mechanical and Electrical Stresses on N-Type FinFETs. IEICE Trans. Electron. (6) (2019)
Wenqi Zhang, Tzuo-Li Wang, Yan-hua Huang, Tsu-Ting Cheng, Shih-Yao Chen, Yiying Li, Chun-Hsiang Hsu, Chih-Jui Lai, Wen-Kuan Yeh, Yilin Yang
Influence of fin number on hot-carrier injection stress induced degradation in bulk FinFETs. Microelectron. Reliab. 67 (2016)
Wen-Teng Chang, Chun-Ming Lai, Wen-Kuan Yeh
Reliability of the doping concentration in an ultra-thin body and buried oxide silicon on insulator (SOI) and comparison with a partially depleted SOI. Microelectron. Reliab. 54 (2) (2014)
Po-Ying Chen, Chi-Chang Chen, Wen-Kuan Yeh, Yukan Chang, Der-Chen Huang, Shyr-Shen Yu, Chwei-Shyong Tsai, Yu-Jung Huang, Wei-Cheng Lin, Shao-I Chu, Chung-Long Pan, Tsung-Hung Lin, Shyh-Chang Liu
Using Capacitance Sensor to Extract Characteristic Signals of Dozing from Skin Surface. J. Sensors 2014 (2014)
Wen-Kuan Yeh, Po-Ying Chen, Kwang-Jow Gan, Jer-Chyi Wang, Chao-Sung Lai
The impact of interface/border defect on performance and reliability of high-k/metal-gate CMOSFET. Microelectron. Reliab. 53 (2) (2013)
Jiann-Shiun Yuan, Wen-Kuan Yeh, Shuyu Chen, Chia-Wei Hsu
NBTI reliability on high-k metal-gate SiGe transistor and circuit performances. Microelectron. Reliab. 51 (5) (2011)
Jiann-Shiun Yuan, J. Ma, Wen-Kuan Yeh, Chia-Wei Hsu
Impact of strain on hot electron reliability of dual-band power amplifier and integrated LNA-mixer RF performances. Microelectron. Reliab. 50 (6) (2010)
Chia-Wei Hsu, Yean-Kuen Fang, Wen-Kuan Yeh, Chun-Yu Chen, Yen-Ting Chiang, Feng-Renn Juang, Chien-Ting Lin, Chieh-Ming Lai
high-k/metal gate MOSFET device with oxygen post deposition annealing. Microelectron. Reliab. 50 (5) (2010)
Chia-Wei Hsu, Yean-Kuen Fang, Wen-Kuan Yeh, Chien-Ting Lin
Significantly improving sub-90 nm CMOSFET performances with notch-gate enhanced high tensile-stress contact etch stop layer. Microelectron. Reliab. 48 (11-12) (2008)
Chieh-Ming Lai, Yean-Kuen Fang, Chien-Ting Lin, Chia-Wei Hsu, Wen-Kuan Yeh
The impacts of high tensile stress CESL and geometry design on device performance and reliability for 90 nm SOI nMOSFETs. Microelectron. Reliab. 47 (6) (2007)