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Significantly improving sub-90 nm CMOSFET performances with notch-gate enhanced high tensile-stress contact etch stop layer.
Chia-Wei Hsu
Yean-Kuen Fang
Wen-Kuan Yeh
Chien-Ting Lin
Published in:
Microelectron. Reliab. (2008)
Keyphrases
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databases
artificial intelligence
information systems
image processing
wide range
multi layer
negatively affect
silicon dioxide
machine learning
genetic algorithm
learning algorithm
video sequences
cmos technology
significantly enhanced