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Significantly improving sub-90 nm CMOSFET performances with notch-gate enhanced high tensile-stress contact etch stop layer.
Chia-Wei Hsu
Yean-Kuen Fang
Wen-Kuan Yeh
Chien-Ting Lin
Published in:
Microelectron. Reliab. (2008)
Keyphrases
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significantly enhanced