Andrew R. Neureuther

Publication Activity (10 Years)

Years Active: 1988-2010
Publications (10 Years): 0

Publications

Lynn T.-N. Wang, Nuo Xu, Seng Oon Toh, Andrew R. Neureuther, Tsu-Jae King Liu, Borivoje Nikolic
Parameter-specific ring oscillator for process monitoring at the 45 nm node. CICC (2010)
Jae-Seok Yang, Andrew R. Neureuther
Crosstalk Noise Variation Assessment and Analysis for the Worst Process Corner. ISQED (2008)
Frank Gennari, Andrew R. Neureuther
A Pattern Matching System for Linking TCAD and EDA. ISQED (2004)
Alfred Kwok Kit Wong, Roberto Guerrieri, Andrew R. Neureuther
Massively parallel electromagnetic simulation for photolithographic applications. IEEE Trans. Comput. Aided Des. Integr. Circuits Syst. 14 (10) (1995)
Edward W. Scheckler, Andrew R. Neureuther
Models and algorithms for three-dimensional topography simulation with SAMPLE-3D. IEEE Trans. Comput. Aided Des. Integr. Circuits Syst. 13 (2) (1994)
Kenny K. H. Toh, Andrew R. Neureuther, Edward W. Scheckler
Algorithms for simulation of three-dimensional etching. IEEE Trans. Comput. Aided Des. Integr. Circuits Syst. 13 (5) (1994)
Edward W. Scheckler, Nelson N. Tam, Anton K. Pfau, Andrew R. Neureuther
An efficient volume-removal algorithm for practical three-dimensional lithography simulation with experimental verification. IEEE Trans. Comput. Aided Des. Integr. Circuits Syst. 12 (9) (1993)
Edward W. Scheckler, Alexander S. Wong, Robert K. Wang, Goodwin R. Chin, John R. Camagna, Andrew R. Neureuther, Robert W. Dutton
A utility-based integrated system for process simulation. IEEE Trans. Comput. Aided Des. Integr. Circuits Syst. 11 (7) (1992)
Roberto Guerrieri, Karim H. Tadros, John K. Gamelin, Andrew R. Neureuther
Massively parallel algorithms for scattering in optical lithography. IEEE Trans. Comput. Aided Des. Integr. Circuits Syst. 10 (9) (1991)
Goodwin R. Chin, Walter C. Dietrich Jr., Duane S. Boning, Alexander S. Wong, Andrew R. Neureuther, Robert W. Dutton
Linking TCAD to EDA - Benefits and Issues. DAC (1991)
Alexander S. Wong, Andrew R. Neureuther
The intertool profile interchange format: a technology CAD environment approach [semiconductor technology]. IEEE Trans. Comput. Aided Des. Integr. Circuits Syst. 10 (9) (1991)
Roberto Guerrieri, Andrew R. Neureuther
Simulation of microcrack effects in dissolution of positive resist exposed by X-ray lithography. IEEE Trans. Comput. Aided Des. Integr. Circuits Syst. 7 (7) (1988)
K. Lee, Andrew R. Neureuther
SIMPL-2: (SIMulated Profiles from the Layout-Version 2). IEEE Trans. Comput. Aided Des. Integr. Circuits Syst. 7 (2) (1988)