gate dielectric stack.

M. Lisiansky Y. Raskin Y. Roizin B. Meyler S. Yofis Y. Shneider

Published in: Microelectron. Reliab. (2017)

Keyphrases

silicon dioxide
gate dielectrics
leakage current
nano scale
artificial intelligence
high density
electrical properties
machine learning
relational databases
high temperature
chemical vapor deposition