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Fabrication of High Aspect Ratio Silicon Nanostructure with Sphere Lithography and Metal-Assisted Chemical Etching and its Wettability.
Nobuyuki Moronuki
Nguyen Phan
Norito Keyaki
Published in:
Int. J. Autom. Technol. (2016)
Keyphrases
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aspect ratio
plasma etching
high density
integrated circuit
electron beam
field effect transistors
semiconductor devices
thin film
magnetic recording
low density
electron beam lithography
focal length
perspective projection
orthographic projection
chemical vapor deposition
x ray