Attractive and Repulsive Fluctuation-Induced Pressure in Peptide Films Deposited on Semiconductor Substrates.
Galina L. KlimchitskayaVladimir M. MostepanenkoOleg Yu. TsybinPublished in: Symmetry (2022)
Keyphrases
- film thickness
- thin film
- plasma etching
- silicon nitride
- chemical vapor deposition
- electrical properties
- silicon dioxide
- high density
- room temperature
- refractive index
- electron microscopy
- permalloy films
- mass spectrometry
- tandem mass spectra
- field effect transistors
- semiconductor manufacturing
- grain size
- production line
- multi layer
- genetic algorithm
- amino acids
- cloud computing
- gallium arsenide
- information systems