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Effect of chamber pressure on red emission from silicon thin films deposited by means of hot-wire CVD.
Ateet Dutt
Yasuhiro Matsumoto
Mauricio Ortega-López
V. Sanchez
María de la Luz Olvera-Amador
Published in:
CCE (2015)
Keyphrases
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thin film
chemical vapor deposition
silicon nitride
high density
plasma etching
electron microscopy
solar cell
silicon dioxide
diesel engine
film thickness
electrical properties
short circuit
grain size
learning algorithm
machine learning
low density
neural network
single image
leakage current