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Impact of Si surface roughness on MOSFET characteristics with ultrathin HfON gate insulator formed by ECR plasma sputtering.

Dae-Hee HanHuiseong HanShun'ichiro Ohmi
Published in: IEICE Electron. Express (2013)
Keyphrases
  • surface roughness
  • leakage current
  • high density
  • specular reflection
  • curved surfaces
  • image processing
  • signal processing
  • light source
  • machine vision
  • magnetic field
  • chemical vapor deposition
  • gate insulator