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Impact of Si surface roughness on MOSFET characteristics with ultrathin HfON gate insulator formed by ECR plasma sputtering.
Dae-Hee Han
Huiseong Han
Shun'ichiro Ohmi
Published in:
IEICE Electron. Express (2013)
Keyphrases
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surface roughness
leakage current
high density
specular reflection
curved surfaces
image processing
signal processing
light source
machine vision
magnetic field
chemical vapor deposition
gate insulator