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Thickness dependent dielectric breakdown of PECVD low-k carbon doped silicon dioxide dielectric thin films: modeling and experiments.
H. Zhou
F. G. Shi
B. Zhao
Published in:
Microelectron. J. (2003)
Keyphrases
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chemical vapor deposition
thin film
silicon dioxide
silicon nitride
high density
room temperature
film thickness
grain size
electrical properties
leakage current
short circuit
machine learning
databases
single image
plasma etching