F. G. Shi

Publication Activity (10 Years)

Years Active: 2003-2004
Publications (10 Years): 0

Publications

H. Zhou, F. G. Shi, B. Zhao, J. Yota
Effect of deposition methods on dielectric breakdown strength of PECVD low-k carbon doped silicon dioxide dielectric thin films. Microelectron. J. 35 (7) (2004)
H. Zhou, F. G. Shi, B. Zhao
Thickness dependent dielectric breakdown of PECVD low-k carbon doped silicon dioxide dielectric thin films: modeling and experiments. Microelectron. J. 34 (4) (2003)