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Effect of deposition methods on dielectric breakdown strength of PECVD low-k carbon doped silicon dioxide dielectric thin films.

H. ZhouF. G. ShiB. ZhaoJ. Yota
Published in: Microelectron. J. (2004)
Keyphrases
  • chemical vapor deposition
  • thin film
  • high density
  • silicon dioxide
  • silicon nitride
  • electrical properties
  • machine learning
  • database
  • artificial neural networks
  • significant improvement