Login / Signup

Electrical characterization of hafnium oxide and hafnium-rich silicate films grown by atomic layer deposition.

Salvador DueñasHelena CastánHéctor GarcíaJ. BarbollaKaupo KukliJ. AarikMikko RitalaMarkku Leskelä
Published in: Microelectron. Reliab. (2005)
Keyphrases