Rapid-Thermal Annealing of Amorphous Silicon on Oxide Semiconductors.

Saurabh Saxena Jin Jang

Published in: IEICE Trans. Electron. (2010)

Keyphrases

electrical properties
silicon nitride
gate dielectrics
leakage current
silicon dioxide
simulated annealing
thin film
high temperature
si sio
room temperature
genetic algorithm
data sets
transmission electron microscopy