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Electrical properties of hafnium silicate films obtained from a single-source MOCVD precursor.

Martin LembergerAlbena PaskalevaStefan ZürcherAnton J. BauerLothar FreyHeiner Ryssel
Published in: Microelectron. Reliab. (2005)
Keyphrases
  • single source
  • electrical properties
  • multi source
  • shortest path problem
  • database
  • objective function
  • cost function
  • np hard
  • film thickness
  • silicon dioxide
  • leakage current