Reliability of TSV interconnects: Electromigration, thermal cycling, and impact on above metal level dielectric.
T. FrankStéphane MoreauCédrick ChappazPatrick LeducLucile ArnaudAurélie ThuaireE. CheryF. LorutLorena AnghelGilles PouponPublished in: Microelectron. Reliab. (2013)