Crosstalk and Gate Oxide Reliability Analysis in Graphene Nanoribbon Interconnects.
Debaprasad DasHafizur RahamanPublished in: ISED (2011)
Keyphrases
- reliability analysis
- leakage current
- silicon dioxide
- field effect transistors
- cmos technology
- low voltage
- input output
- fuel cell
- electrical properties
- low power
- steady state
- high density
- room temperature
- electron microscopy
- mathematical analysis
- high temperature
- fault tree
- high speed
- si sio
- machine learning
- expert systems