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Ultrathin Gate Dielectric Enabled by Nanofog Aluminum Oxide on Monolayer MoS2.
Jung-Soo Ko
Zichen Zhang
Sol Lee
Marc Jaikissoon
Robert K. A. Bennett
Kwanpyo Kim
Andrew C. Kummel
Prabhakar Bandaru
Eric Pop
Krishna C. Saraswat
Published in:
ESSDERC (2023)
Keyphrases
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electrical properties
silicon nitride
gate dielectrics
leakage current
gate insulator
silicon dioxide
si sio
metal oxide semiconductor
low voltage
film thickness
field effect transistors
artificial neural networks
case study
data sets
high density
image processing
databases