Mechanism of gate dielectric degradation by hydrogen migration from the cathode interface.
Yusuke HigashiRiichiro TakaishiKoichi KatoMasamichi SuzukiYasushi NakasakiMitsuhiro TomitaYuichiro MitaniMasuaki MatsumotoShohei OguraKatsuyuki FukutaniKikuo YamabePublished in: Microelectron. Reliab. (2017)